Projection optical apparatus for mask to substrate alignment

Details Projection optical apparatus for mask to substrate alignment Projection optical apparatus for mask to substrate alignment

1987-09-22

1988-10-25

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356400, G01N 2186

Patent

active

047806168

ABSTRACT:
The projection optical apparatus includes light-emitting means which are disposed on a stage movable along the image plane in the projection optical apparatus and which define a light-emitting plane having a predetermined shape; photoelectric detection means which is disposed at a position substantially in conjugate relationship with a pupil of said projection optical apparatus and which receives the light emitted from the light-emitting plane of the light-emitting means through the projection optical system and a mask in which a pattern is defined at a predetermined position; and position detection means which controls the stage in such a way that the image projected on the light-emitting plane is shifted in relation to the mask pattern and which detects the superposed position between the image and the pattern in response to the light signal derived from the photoelectric detection means while the projected image is shifted and to the position of the stage.

REFERENCES:
patent: 4496241 (1985-01-01), Mayer
patent: 4629313 (1986-12-01), Tanimoto
patent: 4639604 (1987-01-01), Murakami et al.
patent: 4642468 (1987-02-01), Tabata et al.
patent: 4650983 (1987-03-01), Suwa

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