Projection objective of a microlithographic projection...

Details Projection objective of a microlithographic projection... Projection objective of a microlithographic projection...

2008-01-09

2010-11-09

Lester, Evelyn A. (Department: 2873)

Optical: systems and elements

Lens

Fluid

C359S666000, C359S649000, C359S651000, C359S717000, C359S798000, C359S799000, C359S800000

Reexamination Certificate

active

07830611

ABSTRACT:
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

REFERENCES:
patent: 4289379 (1981-09-01), Michelet
patent: 4825247 (1989-04-01), Kemi et al.
patent: 4890903 (1990-01-01), Treisman et al.
patent: 4913536 (1990-04-01), Barnea
patent: 4965630 (1990-10-01), Kato et al.
patent: 5229872 (1993-07-01), Mumola
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5523193 (1996-06-01), Nelson
patent: 5665275 (1997-09-01), Kobayashi et al.
patent: 5684637 (1997-11-01), Floyd
patent: 5731909 (1998-03-01), Schachar
patent: 5805273 (1998-09-01), Unno
patent: 6038080 (2000-03-01), Schachar
patent: 6104472 (2000-08-01), Suzuki
patent: 6388823 (2002-05-01), Gaber et al.
patent: 6583850 (2003-06-01), Hummel et al.
patent: 6930838 (2005-08-01), Schachar
patent: 2001/0008440 (2001-07-01), Hummel et al.
patent: 2002/0001088 (2002-01-01), Wegmann et al.
patent: 2002/0008861 (2002-01-01), Singer et al.
patent: 2002/0149864 (2002-10-01), Kaneko
patent: 2002/0181126 (2002-12-01), Nishioka
patent: 2003/0184832 (2003-10-01), Imanishi
patent: 2004/0174619 (2004-09-01), Beck et al.
patent: 2004/0263812 (2004-12-01), Hummel et al.
patent: 2005/0270505 (2005-12-01), Smith
patent: 2006/0012885 (2006-01-01), Beder et al.
patent: 2006/0221456 (2006-10-01), Shafer et al.
patent: 2007/0070316 (2007-03-01), Ehrmann et al.
patent: 2007/0165198 (2007-07-01), Kneer et al.
patent: 198 27 603 (1999-12-01), None
patent: 101 40 608 (2003-03-01), None
patent: 10 2004 051 838 (2005-05-01), None
patent: 0 291 596 (1994-01-01), None
patent: 0 678 768 (1995-10-01), None
patent: 0 851 304 (1998-07-01), None
patent: 1 014 139 (2000-06-01), None
patent: 1 115 030 (2001-07-01), None
patent: 1 128 218 (2001-08-01), None
patent: 1 231 515 (2002-08-01), None
patent: 1 670 041 (2006-06-01), None
patent: 800 5942 (1996-01-01), None
patent: 811 4703 (1996-05-01), None
patent: 09 050954 (1997-02-01), None
patent: 2000 058436 (2000-02-01), None
patent: 2001 013 306 (2001-01-01), None
patent: 2002 131 513 (2002-05-01), None
patent: WO 99/41624 (1999-08-01), None
patent: WO 2004/036316 (2004-04-01), None
patent: WO 2006/053751 (2005-03-01), None
patent: WO 2005/059617 (2005-06-01), None
patent: WO 2005/059654 (2005-06-01), None
patent: WO 2005/071491 (2005-08-01), None
patent: WO 2005/074606 (2005-08-01), None
patent: WO 2006/125617 (2006-11-01), None
K.R. Wolf, “Phosphoric Acid as a High-Index Immersion Fluid,” 22ndAnnual Microelectronic Engineering Conference, May 2004, pp. 40-43.

Affiliated with

Also associated with

Rating

Projection objective of a microlithographic projection... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection objective of a microlithographic projection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection objective of a microlithographic projection... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4217999