Projection objective of a microlithographic projection...

Details Projection objective of a microlithographic projection... Projection objective of a microlithographic projection...

2006-08-16

2009-06-09

Lee, Diane I (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S066000, C359S822000, C359S846000, C359S849000

Reexamination Certificate

active

07545482

ABSTRACT:
A projection objective of a microlithographic projection exposure apparatus has a plurality of optical elements, for example lenses or mirrors. The objective furthermore includes an actuator for exerting a mechanical force that deforms a selected optical element of the projection objective. A manipulator modifies the spatial position of one of the optical elements as a function of the force exerted by the actuator.

REFERENCES:
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patent: 6398373 (2002-06-01), Guzman et al.
patent: 6411426 (2002-06-01), Meehan et al.
patent: 6840638 (2005-01-01), Watson
patent: 2002/0089734 (2002-07-01), Meehan et al.
patent: 198 59 634 (2000-06-01), None

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