Optical: systems and elements – Lens – With variable magnification
Reexamination Certificate
2011-07-19
2011-07-19
Mack, Ricky L (Department: 2873)
Optical: systems and elements
Lens
With variable magnification
Reexamination Certificate
active
07982969
ABSTRACT:
A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.
REFERENCES:
patent: 5880891 (1999-03-01), Fuerter
patent: 2002/0023903 (2002-02-01), Ann Ngoi et al.
patent: 2005/0225737 (2005-10-01), Weissenrieder et al.
patent: 2006/0066962 (2006-03-01), Totzeck et al.
patent: 196 16 922 (1997-10-01), None
patent: 0 724 199 (1996-07-01), None
patent: 0 937 999 (1999-08-01), None
patent: WO 2005/001527 (2005-01-01), None
patent: WO 2005/054954 (2005-06-01), None
patent: WO 2005/059618 (2005-06-01), None
patent: WO 2005/069055 (2005-07-01), None
patent: WO 2005/111689 (2005-11-01), None
patent: WO 2005/121899 (2005-12-01), None
E. Delano, “First-order Design and the y, {hacek over (e)}y Diagram”, Applied Optics, 1963, vol. 2, No. 12, pp. 1251-1256.
H. Hammer et al., “Reconstruction of spatially inhomogeneous dielectric tensors through optical tomography”, J. Opt. Soc. Am. A, vol. 22, No. 2, Feb. 2005, pp. 250-255.
A. C. Kak and M. Slaney, “Principles of Computerized Tomographic Imaging”, IEEE press, New York, 1987, which is also published on the Internet at http://www.slaney.org/pet/.
Beder Susanne
Clauss Wilfried
Dittmann Olaf
Feldmann Heiko
Gruner Toralf
Carl Zeiss SMT GmbH
Fish & Richardson P.C.
Greece James R
Mack Ricky L
LandOfFree
Projection objective of a microlithographic projection... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection objective of a microlithographic projection..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection objective of a microlithographic projection... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2691363