Projection objective for microlithography

Details Projection objective for microlithography Projection objective for microlithography

2007-09-18

2007-09-18

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000

Reexamination Certificate

active

10919376

ABSTRACT:
A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.

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Shr-Jia Shiu et al., Electron Beam Lithography for Fabricating Sub-Wavelength Grating on Quartz, National Chiao Tung University Hsinchu, Taiwan.
Rong-Chung Tyan et al., Polarizing beam splitters constructed of form-birefringent multilayer gratings, SPIE Proc., vol. 2689, pp. 82-89.

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