Projection objective for lithography

Details Projection objective for lithography Projection objective for lithography

2010-10-06

2011-11-29

Pritchett, Joshua L (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S362000

Reexamination Certificate

active

08068276

ABSTRACT:
In some embodiments, a projection objective for lithography includes an optical arrangement of optical elements between an object plane and an image plane. The arrangement generally has at least one intermediate image plane, the arrangement further having at least two correction elements for correcting aberrations, of which a first correction element is arranged optically at least in the vicinity of a pupil plane and a second correction element is arranged in a region which is not optically near either a pupil plane or a field plane.

REFERENCES:
patent: 5677757 (1997-10-01), Taniguchi et al.
patent: 7835073 (2010-11-01), Feldmann et al.
patent: 2006/0056064 (2006-03-01), Shafer et al.
patent: 2006/0087633 (2006-04-01), Omura et al.
patent: 2006/0256447 (2006-11-01), Dodoc
patent: 2007/0019305 (2007-01-01), Ulrich et al.
patent: 1746463 (2007-01-01), None
patent: 2007 013179 (2007-01-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2004/097911 (2004-11-01), None
patent: WO 2006/055471 (2006-05-01), None
patent: WO 2006/121008 (2006-11-01), None

Affiliated with

Also associated with

Rating

Projection objective for lithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection objective for lithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection objective for lithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4267078