Optical: systems and elements – Mirror – With support
Reexamination Certificate
2008-09-30
2008-09-30
Pritchett, Joshua L (Department: 2872)
Optical: systems and elements
Mirror
With support
C359S900000, C378S034000, C702S188000
Reexamination Certificate
active
11014537
ABSTRACT:
A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1to M6) that each have a mirror support (241to246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241to246) are provided with a desired surface deformation (34). If the mirrors (M1to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.
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Enkisch Hartmut
Mann Hans-Juergen
Muellender Stephan
Trenkler Johann
Carl Zeiss SMT AG
Pritchett Joshua L
Young & Basile P.C.
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