Projection exposure system for microlithography and method...

Details Projection exposure system for microlithography and method... Projection exposure system for microlithography and method...

2005-08-16

2005-08-16

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

06930758

ABSTRACT:
A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

REFERENCES:
patent: 4755027 (1988-07-01), Schäfer
patent: 5245470 (1993-09-01), Keum
patent: 5300972 (1994-04-01), Kamon
patent: 5365371 (1994-11-01), Kamon
patent: 5436761 (1995-07-01), Kamon
patent: 5442184 (1995-08-01), Palmer et al.
patent: 5465220 (1995-11-01), Haruki et al.
patent: 5559583 (1996-09-01), Tanabe
patent: 5673103 (1997-09-01), Inoue et al.
patent: 5675401 (1997-10-01), Wangler et al.
patent: 5677755 (1997-10-01), Oshida et al.
patent: 5691802 (1997-11-01), Takahashi
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5815247 (1998-09-01), Poschenrieder et al.
patent: 5933219 (1999-08-01), Unno
patent: 6163367 (2000-12-01), Obszarny
patent: 6169627 (2001-01-01), Schuster
patent: 6191880 (2001-02-01), Schuster
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6295122 (2001-09-01), Schultz et al.
patent: 6310679 (2001-10-01), Shiraishi
patent: 6392800 (2002-05-01), Schuster
patent: 6452662 (2002-09-01), Mulkens et al.
patent: 6466303 (2002-10-01), Omura et al.
patent: 6636295 (2003-10-01), Shiozawa
patent: 6661499 (2003-12-01), Omura et al.
patent: 2001/0022687 (2001-09-01), Takahashi et al.
patent: 2004/0057036 (2004-03-01), Kawashima et al.
patent: 2004/0119954 (2004-06-01), Kawashima et al.
patent: 199 54 727 (2003-10-01), None
patent: 0 764 858 (1997-03-01), None
patent: 0764858 (1997-03-01), None
Matsumoto et al. “Issues and mthod of designing lenses for optical lithography.” Optical Engineering, 31:12, pp.2657-2664, Dec. 1992.
Unno, Yasuyuki. “Polarization effect of illumination light.” Optical/Laser Microlithography, VI, pp. 879-891, 1993.

Affiliated with

Also associated with

Rating

Projection exposure system for microlithography and method... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Projection exposure system for microlithography and method..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure system for microlithography and method... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3502040