Projection exposure method and projection exposure system...

Details Projection exposure method and projection exposure system... Projection exposure method and projection exposure system...

2005-07-14

2011-12-20

Kim, Peter B (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

08081295

ABSTRACT:
In the case of a projection exposure method for exposing a radiation-sensitive substrate, arranged in the region of an image surface of a projection objective, with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective, a mask is arranged in the region of the object surface of the projection objective, the mask having a first pattern area with a first subpattern, and at least one second pattern area, arranged laterally offset from the first pattern area, with a second subpattern. The mask is scanned by relative movement between the mask and the illumination field of the illumination system in such a way that initially the first subpattern and thereafter the second subpattern is irradiated with the illumination radiation of the illumination field. The first subpattern is irradiated during a first illumination time interval with a first angular distribution, adapted to the first subpattern, of the illumination radiation. Thereafter, the second subpattern is irradiated during the second illumination time interval with a second angular distribution, adapted to the second subpattern, of the illumination radiation, said second angular distribution differing from the first angular distribution.

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Machine translation of JP 2004-311639 dated Nov. 4, 2011.

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