Projection exposure method and mask employed therein

Details Projection exposure method and mask employed therein Projection exposure method and mask employed therein

1996-02-29

1998-07-07

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057766380

ABSTRACT:
A method of projection exposure utilizing a mask including a step of exposing an object by utilizing a transparent mask substrate of which the upper surface is slanted at a predetermined angle from a direction perpendicular to the light path and an opaque film pattern is formed at regular intervals on a lower surface of the mask substrate so that the phase difference between adjacent mask patterns occurs due to the slanted mask substrate, thereby reducing the minimum pitch available for pattern formation without a shorter-wavelength light source and without increasing NA by reducing the frequency difference .delta.v to the pitch d of the mask in a given wavelength of a light source and NA.

REFERENCES:
patent: 4938841 (1990-07-01), Shahar et al.
patent: 5356738 (1994-10-01), Inoue et al.

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