Photocopying – Projection printing and copying cameras – Methods
Reexamination Certificate
2009-02-27
2011-12-13
Glick, Edward (Department: 2882)
Photocopying
Projection printing and copying cameras
Methods
C355S067000, C716S055000
Reexamination Certificate
active
08077292
ABSTRACT:
A projection exposure method that projects the shape of a hole onto a wafer by projecting a diffracted light, which is produced by applying light to a mask having a pattern for forming a hole pattern, onto the wafer through a projection optical system for exposure, wherein, in a plane substantially perpendicular to an optical axis, the light applied to the mask has a first intensity distribution in which the intensity is higher in the vicinity of eight apexes of an octagon centered at the optical axis than in other areas, the mask has a plurality of first opening patterns are arranged in a rectangular lattice configuration having sides parallel to diagonals of the octagon passing through the optical axis, and a plurality of second opening patterns are arranged in a face-centered rectangular lattice configuration having sides parallel to diagonals of the octagon passing through the optical axis.
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Kitamura et al., “Patterning Performance for Contact Hole for 32nm Node HDSRAM Using Optimized Illumination Shape”, Japan Applied Physics Conference, 1 page.
Fukuhara Kazuya
Kitamura Yosuke
Mimotogi Shoji
Satake Masaki
Artman Thomas R
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Glick Edward
Kabushiki Kaisha Toshiba
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