Projection exposure apparatus and projection exposure method

Details Projection exposure apparatus and projection exposure method Projection exposure apparatus and projection exposure method

1994-09-30

2000-07-25

Pham, Hoa Q.

Optics: measuring and testing

By polarized light examination

With light attenuation

356400, 356363, 2505593, 250548, G01B 1114

Patent

active

060942681

ABSTRACT:
A projection exposure apparatus (1) comprises an incident light optical system for causing the light emitted from a light source 1 to enter an object of exposure (4) in diagonal direction, a detection apparatus (3) for causing an interference between the light reflected from the object of exposure (4) and a reference light and detecting the resultant interference fringe, a processing circuit for determining the inclination and height of the surface of the object of exposure (4) from the optical information on the interference fringe, and a stage (7) for supporting the object of exposure (4). The object of exposure (4) is subjected to projection exposure by driving the stage (7) according to the calculated inclination and height of the object of exposure (4).

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