Projection exposure apparatus and exposure method

Details Projection exposure apparatus and exposure method Projection exposure apparatus and exposure method

1995-05-05

1996-07-23

Dang, Khanh

Photocopying

Projection printing and copying cameras

Step and repeat

G03B 2742

Patent

active

055394973

ABSTRACT:
A projection exposure apparatus and method for exposing a pattern on a mask onto a photosensitive substrate through a projection optical system comprises a two-dimensionally driven mask holding stage and a two-dimensionally driven substrate holding stage. Vibration sensors detect vibration of the mask and the projection optical system. A control device controls at least one of the mask holding stage and the substrate holding stage according to an output from at least one of the sensors so as to maintain a relative position between the mask and the substrate. The control device may memorize information regarding relative lateral shift and rotation of the mask and the substrate due to vibration, predict lateral shift and rotation on the basis of memorized information and information from vibration sensors, and employ the prediction in maintaining the relative position between the mask and the substrate. Exposure is performed so as to minimize the effects of vibration.

REFERENCES:
patent: 4595282 (1986-06-01), Takahashi

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