Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1988-05-10

1989-08-15

Evans, F. L.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

250548, G01B 1100

Patent

active

048569054

ABSTRACT:
A projection exposure apparatus capable of improving the precision of baseline measurement has an objective optical system whose chromatic aberration has been corrected for a first wavelength and a second wavelength and which is used for introducing the lights of first and second wavelengths into an imging optical system through a mask, a first illuminating system for focusing the light of the first wavelength at a plane of the mask and a plane of a substrate through the objective optical system, a second illuminating system for focusing the light of the second wavelength at a plane of the mask and a plane of the substrate through the objective optical system, and deflecting means for commonly deflecting the lights of first and second wavelengths entering the objective optical system in such a manner that the lights of first and second wavelengths respectively scan alignment marks formed on the mask and substrate at the same time.

REFERENCES:
patent: 4795244 (1989-01-01), Uehara et al.
patent: 4798962 (1989-01-01), Matsumoto et al.

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