Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1989-05-17

1990-01-30

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

048975532

ABSTRACT:
A projection exposure apparatus for projecting a pattern on a mask illuminated by exposure light onto a substrate placed on a movable stage through a projection optical system is disclosed. A fiducial mark is provided at a predetermined position on the stage, a mark pattern is provided at a predetermined position on the mask and an illuminating optical system directs light of a wavelength equal to that of the exposure light to illuminate the fiducial mark. A position detector photoelectrically detects the mark pattern and the image of the fiducial mark formed on the mask through the projection optical system and detects the relative position of the mask and the stage. A device for interchanging the substrate on the stage with another substrate, and controller for controlling both of the position detector and the substrate interchanging device is used so that the position detector terminates the detection of position during the substrate interchange by the substrate interchanging device.

REFERENCES:
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4636626 (1987-01-01), Hazama et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4677301 (1987-06-01), Tanimoto et al.
patent: 4766309 (1988-08-01), Kudo

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