Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

1994-06-06

1995-12-05

Hayes, Monroe H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 355 74, G03B 2742

Patent

active

054734100

ABSTRACT:
Disclosed is a projection exposure apparatus by a scan-exposure method. The apparatus includes an illuminating means for illuminating a mask transfer region with illumination light for an exposure through an aperture of a variable field stop disposed in a position substantially conjugate to the mask; a driving means for configuring the aperture of the variable field stop in a rectangular shape (having edges orthogonal to a direction of the scan-exposure) and simultaneously making variable a width of the rectangular aperture of the stop in a widthwise direction (the scan-exposure direction) of the transfer region (pattern forming region) on the mask; and a control means for controlling the driving means to change a width of the rectangular aperture of the variable field stop in interlock with variations in position of the variable field stop on the mask transfer region which varies due to the one-dimensional movements of the mask stage.

REFERENCES:
patent: 4747678 (1988-05-01), Shafer et al.
patent: 4924257 (1990-05-01), Jain
patent: 5105075 (1992-04-01), Ohta et al.
Optical/Laser Microlithography II, Jere D. Buckley et al, SPIE vol. 1088 (1989), pp. 424-433.

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