Projection exposure apparatus

Photocopying – Projection printing and copying cameras – Step and repeat

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Details

355 67, 356400, 250548, G03B 2742, G01B 1100

Patent

active

059203781

ABSTRACT:
A projection exposure apparatus includes off-axis type plate alignment systems which make it possible to reduce alignment time and thereby increase throughput. Exposure of large photosensitive plates is made possible without increasing the length of the plate stage stroke. Multiple fiducial mark members including fiducial mark members in different positions on a plate stage are utilized. Multiple off-axis type plate alignment systems are used to observe the multiple fiducial marks.

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patent: 5751404 (1998-05-01), Murakami et al.

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