Projection exposure apparatus

Details Projection exposure apparatus Projection exposure apparatus

2007-01-25

2008-12-09

Collins, Darryl J (Department: 2873)

Optical: systems and elements

Lens

C359S727000, C359S726000, C359S732000

Reexamination Certificate

active

07463422

ABSTRACT:
A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LHis determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LHis above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.

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DeJager, ȁ

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