Photocopying – Projection printing and copying cameras – Step and repeat
Reissue Patent
2006-05-02
2006-05-02
Mathews, Alan (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S050000, C355S072000, C356S399000, C430S022000
Reissue Patent
active
RE039083
ABSTRACT:
Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.
REFERENCES:
patent: 3538828 (1970-11-01), Genpvese
patent: 4747678 (1988-05-01), Shafer et al.
patent: 4748478 (1988-05-01), Suwa et al.
patent: 4749867 (1988-06-01), Matsushita et al.
patent: 4822975 (1989-04-01), Torigoe
patent: 4924257 (1990-05-01), Jain
patent: 5004348 (1991-04-01), Magome
patent: 5187519 (1993-02-01), Takabayashi et al.
patent: 5227839 (1993-07-01), Allen
patent: 5281996 (1994-01-01), Bruning et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5506684 (1996-04-01), Ota et al.
patent: 5767948 (1998-06-01), Loopstra et al.
patent: 5796469 (1998-08-01), Ebinuma
patent: A-56-60017 (1981-05-01), None
patent: A-62-150721 (1987-07-01), None
patent: 63-128713 (1988-06-01), None
patent: A-64-18002 (1989-01-01), None
patent: A-1-251210 (1989-10-01), None
patent: A-3-129720 (1991-06-01), None
patent: A-4-196513 (1992-07-01), None
patent: A-4-235558 (1992-08-01), None
patent: A-4-277612 (1992-10-01), None
patent: A-4-291913 (1992-10-01), None
Buckley et al., “Step and scan: A systems overview of a new lithography tool”, SPIE vol. 1088 Optical/Laser Microlithography II (1989), p. 424-433.
Mathews Alan
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Projection exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Projection exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Projection exposure apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3652414