Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Patent
1985-10-21
1987-11-24
LaRoche, Eugene R.
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
356152, G01B 1126
Patent
active
047084847
ABSTRACT:
The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer. To the end of dispensing with the withdrawal of a microscope objective in such a way that the objective of a microscope for detecting the mask and the wafer and projection light, for example, an X-ray, are prevented from interfering, thereby to achieve the enhancement of throughput and to permit the detection of the positions of the mask and the wafer even during projection, the present invention consists in that the objective of the microscope is inclined with respect to a perpendicular to the plane of the mask or the plane of the wafer being a plane to-be-detected, so as not to interfere with the projection light, for example, the X-ray, whereby the circuit pattern can be transferred while the relative positions of the mask and the wafer are being detected.
REFERENCES:
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4614431 (1986-09-01), Komeyama
patent: 4616130 (1986-10-01), Omata
Funatsu Ryuuichi
Ikeda Minoru
Inagaki Akira
Kembo Yukio
Komeyama Yoshihiro
Hitachi , Ltd.
LaRoche Eugene R.
Pascal Robert J.
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