Projection aligner with a sensor for monitoring light quantity

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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Details

356218, 356222, G01J 132, G01J 142, G05D 2500

Patent

active

047016086

ABSTRACT:
A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.

REFERENCES:
patent: 3422442 (1969-01-01), Glendinning et al.
patent: 3949226 (1976-04-01), Dugan et al.
patent: 4161363 (1979-07-01), Kahle
patent: 4163150 (1979-07-01), Stankewitz

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