Projection aligner method utilizing monitoring of light quantity

Details Projection aligner method utilizing monitoring of light quantity Projection aligner method utilizing monitoring of light quantity

1987-09-23

1988-10-25

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356222, G01J 132, G01J 142, G05D 2500

Patent

active

047806060

ABSTRACT:
A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.

REFERENCES:
patent: 4598197 (1986-07-01), Morita et al.
patent: 4701608 (1987-10-01), Morita et al.

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