Photocopying – Projection printing and copying cameras – Illumination systems or details
Patent
1998-08-28
2000-07-04
Metjahic, Safet
Photocopying
Projection printing and copying cameras
Illumination systems or details
355 53, 430 5, G03B 2772, G03B 2742, G03F 900
Patent
active
060846569
ABSTRACT:
This invention discloses a programmable mask for exposure apparatus which is formed by an integrated pixels of a micro-devices which shut or open a light by an electrical signal. This invention provides a photolithography method by projecting on a silicon wafer a directly designed circuit pattern which is made on a programmable mask fabricated by an integration of many a micro optical shutter devices as a pixels.
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Peter D. Buck, "A 0.5 Micron Optical Mask Process for 364 nm Scanned Laser Lithography", SPIE vol. 1264 Optical/Laser Microlithography III (1990), pp. 158-166.
Shigehisa Ohki et al., "High-Precision X-Ray Mask Technology", JJAP Series 4, Proc. Of 1990 Intern, MicroProcess Conference, pp. 68-72.
Jen-Yu Yew et al., "Mix-and-match lithography processes for 0.1 .mu.m MOS transistor device fabrication", SPIE vol. 2723, pp. 180-188.
Baek Jong Tae
Choi Chang Auck
Jang Won Ick
Kim Bo Woo
Lee Jong Hyun
Electronics and Telecommunications Research Institute
Metjahic Safet
Nguyen Hung Henry
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