Profiled substrate heating utilizing a support temperature and a

Electric resistance heating devices – Heating devices – Radiant heater

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219290, 219411, 118725, 427557, H01L 2126

Patent

active

057907501

ABSTRACT:
An apparatus and method for thermal processing, and more particularly for rapid thermal processing wherein a first thermal radiator generates and projects a first pattern of thermal radiation onto a first surface of a substrate, and wherein a second thermal radiator generates and projects a second pattern of thermal radiation onto a second surface of the substrate. The temperatures on the first and second surfaces are sensed by temperature sensors. A mechanism for selectively controlling the first and second thermal radiators in response to the temperature sensors causes a prescribed temperature profile to be produced within the substrate.

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