Production of X-ray lithograph masks

Details Production of X-ray lithograph masks Production of X-ray lithograph masks

1979-12-26

1982-05-11

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 16, 430 17, 430296, 430328, 430396, 430966, 430967, 430156, 427160, G03C 516, B05D 306, G21K 300, H05G 100

Patent

active

043294103

ABSTRACT:
A method of depositing X-ray absorber patterns on a mask membrane to achieve minimum pattern feature dimensions less than 1 .mu.m. The membrane is covered with an ultraviolet (VU) sensitive photoresist which carries a thin metallic film. The metallic film is coated with an electron beam resist. The electron beam resist is exposed to the desired pattern by an electron beam. After development, the metal film is etched through the remaining electron beam resist. This forms a stencil overlying the lower UV photoresist layer which is then exposed by an ultraviolet or soft X-ray source. After development, an X-ray absorber, such as gold, is deposited on the membrane. The final exposure step may be done by means of a point source of radiation. The X-ray absorbers will then have sloping walls to prevent shadowing of the X-ray source.

REFERENCES:
patent: 2702243 (1955-02-01), Schmidt
patent: 3313626 (1967-04-01), Whitney
patent: 3317320 (1967-05-01), Reber
patent: 3423205 (1969-01-01), Skaggs et al.
patent: 3743842 (1973-07-01), Smith et al.
patent: 3971860 (1976-07-01), Bruers et al.
patent: 4018938 (1977-04-01), Feder et al.
patent: 4022927 (1977-05-01), Pfeiffer et al.
patent: 4035522 (1977-07-01), Hatzakis
patent: 4123272 (1978-10-01), Quinn
patent: 4211834 (1980-07-01), Lapadula et al.
patent: 4260670 (1981-04-01), Burns
Moron, J. M. et al., "High Resolution Steep Profile, Resist Patterns," The Bell System Tech. Journal, vol. 58, No. 5, 5/1979, pp. 1027-1036.
Moran, J. M. et al., "Photopolymer Principles-Processes and Materials," 10/1979, Soc. of Plastics Eng. Inc., pp. 248-255 and FIG. 1-11.
Dunkleberger, L. N., "Stencil Technique . . . Josephson Devcies," J. Vac. Sci. Tech., 15 (1), 1/1978.
Spiller, E. et al., "X-Ray Lithography for Bubble Devices," Solid State Technology, 4/1976, pp. 62-67.
Romankiw et al., IBM Tech. Disclosure Bulletin, vol. 18, _No. 12, 5/1976, p. 4219.
Dolgov et al., IBM Tech. Disclosure Bulletin, vol. 15, No. 8, 1/1973, p. 2570.
Howe, D., Research Disclosure, 9/1978, #17358.
Flanders, D. C., J. Vac. Sci. Tech., pp. 1615-1619, 16(c), 12/1979.
MacIntyre et al., IBM Technical Disclosure Bulletin, vol. 14, No. 10, 3/1972, p. 2878.

Affiliated with

Also associated with

Rating

Production of X-ray lithograph masks does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production of X-ray lithograph masks, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production of X-ray lithograph masks will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-756471