Production of fullerenes by sputtering

Details Production of fullerenes by sputtering Production of fullerenes by sputtering

1994-11-29

1996-02-27

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429819, C23C 1434

Patent

active

054945585

ABSTRACT:
A process and system for producing fullerenes by sputtering. A carbon target is sputtered to form a vapor of sputtered carbon atoms. The sputtered carbon atoms are quenched in an atmosphere of inert gas and deposited onto a collection substrate. The resulting carbon soot is extracted to recover fullerenes. The process produces carbon soot which is rich in C.sub.70 and higher fullerenes.

REFERENCES:
patent: 4565618 (1986-01-01), Banks
patent: 4872905 (1989-10-01), Bourne et al.
patent: 5071708 (1991-12-01), Komaki et al.

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