Production of etch-resist colloid and material suitable therefor

Details Production of etch-resist colloid and material suitable therefor Production of etch-resist colloid and material suitable therefor

1978-05-30

1980-05-13

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

20415912, 252304, 252316, 430285, G03C 500, G03C 168

Patent

active

042026970

ABSTRACT:
A radiation-sensitive material is described that comprises a hydrophilic colloid layer containing a dispersed phase of at least one radiation sensitive polymer the polymer chain of which comprises units with side substituents containing oxime ester groups. Upon imagewise exposure to actinic radiation the polymer in the exposed areas reduces the permeability of the hydrophilic colloid layer for an etchant in the absence of any ethylenically unsaturated monomer. The layer having upon image-wise exposure to radiation image-wise differentiations in permeability for an etchant can be used as etch-resist, without needing a washing away step, to modify image-wise the surface of an element e.g. to produce printed circuits or printing forms.

REFERENCES:
patent: 3074869 (1963-01-01), Workman
patent: 3558309 (1971-01-01), Laridon et al.
patent: 3558311 (1971-01-01), Delzenne et al.
patent: 3592646 (1971-07-01), Holstead et al.
patent: 3682642 (1972-08-01), Laridon et al.
patent: 3718473 (1973-02-01), Gerlay et al.

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