Production of diffuse reflective coatings by atomic layer epitax

Details Production of diffuse reflective coatings by atomic layer epitax Production of diffuse reflective coatings by atomic layer epitax

1992-02-10

1993-10-26

Chaudhuri, Olik

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156614, 427253, 427294, 427296, C30B 2504

Patent

active

052562441

ABSTRACT:
Diffusely reflecting metal oxide, preferably titanium dioxide, coatings are prepared on substrates by atomic layer epitaxy. Successive pulses of a hydrolyzable metal chloride and water are introduced at pressures in the range of about 180-1250 and about 150-650 millitorr, respectively, the pulse length being effective to produce a coating with an average thickness of about 15-25 .ANG.ngstroms during a single pulse pair.

REFERENCES:
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Goodman et al., J. Appl. Phys., 60(3) R65-R81 (1986).
Denbaars et al., J. Crys. Growth, 93, 195-200 (1988).
"Formation and Structure of titanium oxide layers on the surface of tantalum"; Ezhovskii et al., Izv. Akad. Nauk SSSR, Neorg. Mater., 20(2), pp. 253-256; (1984).
"Formation of titanlum oxides on Silicon dioxide"; Scheschinskii et al.; Wiss. Z.-Friedrich-Schiller-Univ. Jena, Math-Naturwiss. Reihe, 28(5-6), pp. 659-666; (1978).

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