Production method of an x-ray mask structure, an x-ray mask stru

Details Production method of an x-ray mask structure, an x-ray mask stru Production method of an x-ray mask structure, an x-ray mask stru

1995-03-30

1995-11-21

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 430 5, H01L 3900

Patent

active

054694892

ABSTRACT:
The present invention provides a simple and easy processing method for producing an X-ray mask structure having an X-ray absorber whose side walls have waviness. More specifically, in accordance with the present invention, the method for producing an X-ray mask structure which comprises an X-ray absorber, an X-ray transmissive membrane for supporting the X-ray absorber, and a supporting frame for supporting the X-ray transmissive membrane, includes a step of forming the X-ray absorber by depositing an X-ray absorber material in the regions between resist patterns, the above resist patterns having waviness on the side walls of the resist patterns.

REFERENCES:
patent: 5012500 (1991-04-01), Watanabe et al.
patent: 5052033 (1991-09-01), Ikeda et al.
patent: 5177773 (1993-01-01), Oizumi et al.

Affiliated with

Also associated with

Rating

Production method of an x-ray mask structure, an x-ray mask stru does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Production method of an x-ray mask structure, an x-ray mask stru, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Production method of an x-ray mask structure, an x-ray mask stru will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1144110