Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1987-08-18
1989-05-30
Lacey, David L.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156644, 156646, 1566591, 156668, 156902, 20419232, 20419236, 29852, C23F 102
Patent
active
048348350
ABSTRACT:
Viaholes are dry-etched into glass fiber reinforced plastic sheets according to a predetermined hole pattern, leaving the glass fiber meshing practically unaffected.
The method is used, for instance, to fabricate plastic sheets with unilaterally or bilaterally applied conductor patterns and viaconnectors that are conductively linked to the conductor patterns, and to fabricate multilayer board laminates obtained by several plastic sheets carrying the conductor pattern being alternately packaged, if required, with untreated copper sheets, and by the package thus obtained being subsequently laminated. Such boards and/or plastic sheets bilaterally provided with conductor patterns may be used as connector boards for, say, multilayer ceramic modules carrying semiconductor chips.
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Yeh, J. T. C., et al., "Magnetic field enhanced reactive ion etching of polyimide", J. Vac. Sci. Technol. A 2 (3), pp. 1292-1295, Jul.-Sep. 1984.
Eggitto, F. D., et al., Plasma etching of organic materials, I, Polyimide in 02-CF4, J. Vac. Sci. Technol. B3 (3), pp. 893-904, May/Jun. 1985.
Turban, G. and Rapequx, M., "Dry Etching of Polyimide in 02-CF4 and 02-SF4 Plasmas", J. Electrochem. Soc.: Solid-State Schience and Technology, pp. 2231-2236, Nov. 1983.
Ting, C. H., et al., Semiconductor International, Feb. 1985.
Abstract No. 179 from 1046 Extended Abstracts, T. O. Herndon, W. J. Landoch, & R. O. Burke, entitled "Plasma Etching of Vias in Polyimide Using Nonerodible Masks", vol. 83-1, May 1983, p. 290, Pennington, NJ, USA.
Abstract of "Reaction Kinetic Processes at the Interface Between Nonisothermal Plasma and Solid", J. Freidrich, p. 397 of Catalysis, Kinetics, vol. 95, 1981, Berlin, Ger. Dem. Rep.
Cziep Werner
Kuenzel Ulrich
Ruh Wolf-Dieter
Dang Thi
International Business Machines Corp.
Lacey David L.
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