Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-01-24
2006-01-24
Barreca, Nicole (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S314000, C430S322000, C430S323000, C430S324000, C438S489000, C216S037000
Reexamination Certificate
active
06989230
ABSTRACT:
In a process of producing low k inter-layer dielectric film in an interconnect structure on a semiconductor body, the improvement of preventing resist poisoning effects, comprising:a) providing an interconnect structure comprising a substrate and metal line on a semiconductor body;b) depositing an antireflective (ARC) coating layer over the substrate and metal line;c) depositing a Si-containing resist coating on the ARC layer;d) affecting photolithography to provide a contact hole in the Si-containing resist coating;e) affecting silylation to obtain a Si-rich film by increasing Si content in the resist coating;f) subjecting the Si-rich film to oxidation to convert it to a low k oxide porous dielectric film; andg) affecting an ARC opening by removing the ARC coating in the contact hole.
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Barreca Nicole
Infineon - Technologies AG
Slater & Matsil L.L.P.
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