Producing a substrate having high surface-area texturing

Details Producing a substrate having high surface-area texturing Producing a substrate having high surface-area texturing

2008-04-08

2008-04-08

Young, Christopher G. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S275100, C430S302000, C430S322000, C430S323000, C430S396000, C430S945000, C216S065000, C216S067000, C216S075000, C216S079000

Reexamination Certificate

active

11092540

ABSTRACT:
A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High surface-area textured substrates, in particular, miniaturized planar analysis devices having high surface-area textured features, prepared by the methods disclosed herein, are also provided. A method by which the high surface-area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.

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