Processing system

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

25049221, H01J 3720

Patent

active

052488861

ABSTRACT:
Load lock chambers having a function of detecting positional deviation of wafers are provided in a process chamber of an ion injection apparatus, two on a carrying-in side, and two on a carrying-out side. One load lock chamber on the carrying-in side and one on the carrying-out side are used as a standby. Carrying-in carrying-out members and are outside of the process chamber. Two transfer members are in the process chamber. A dummy wafer stage is formed at a position which can be accessed by the transfer members. Wafers are transferred from load stages by the carrying-in member via the load lock chambers to the process chamber through a double operation line. Loading a wafer on the turn table and unloading a wafer therefrom can be performed simultaneously by operations of the transfer members and. The wafers are similarly carried out of the apparatus in a double operation line. At this time, dummy wafers in the process chamber can be used, if necessary.

REFERENCES:
patent: 4433951 (1984-02-01), Koch
patent: 4553069 (1985-11-01), Purser
patent: 4700077 (1987-10-01), Dykstra et al.
patent: 4705951 (1987-11-01), Layman et al.
patent: 4745287 (1989-05-01), Turner
patent: 4831270 (1989-05-01), Weisenberger
patent: 4986715 (1991-01-01), Asahawa
patent: 5004924 (1991-04-01), Imahashi
patent: 5064337 (1991-11-01), Asahawa
Nuclear Instruments and Methods in Physics Research/Section B, vol. B21, No. 2-4, Mar. 1987, pp. 224-228, C. Taylor et al., "200 mm End Station for Ion Beam Implanters".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing system will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2192718

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.