Processing system

Details Processing system Processing system

2008-01-01

2008-01-01

Mayekar, Kishor (Department: 1753)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With gas inlet structure

C156S345480

Reissue Patent

active

10463435

ABSTRACT:
A processing system has an upper electrode with gas discharge holes of a shape corresponding to the external we of insulating members. The insulating members are formed of a poly(ether etherketone) resin, a polyimide resin, a poly (ether imide) resin or the like. Each insulating member has a step at its outer surface and an internal longitudinal through hole tapered to expand toward the processing chamber. The insulating members are pressed in the gas discharge holes to bring the steps into contact with shoulders formed in the sidewalls of the gas discharge holes. A part of each insulating member, as fitted in the gas discharge hole, projects from a surface of the upper electrode that faces a susceptor.

REFERENCES:
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patent: 61-67922 (1996-04-01), None
patent: 9-27398 (1997-01-01), None
International Preliminary Examination Report for PCT/JP98/06610, mailed May 2004.
Supplementary European Search Report, issued in connection with EP 98 91 2715, mailed May 7, 2004.
Patent Abstracts of Japan, Publication No. 08264462, Publication Date: Oct. 11, 1996.

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