Processing method using a focused ion beam

Details Processing method using a focused ion beam Processing method using a focused ion beam

1982-12-08

1984-07-03

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156657, 156662, 156345, 204192E, 204298, 2504922, 2504923, H01L 21306, B44C 122, C03C 1500, C23F 102

Patent

active

044578032

ABSTRACT:
A processing method using a focused ion beam is proposed which uses a focused ion beam radiation apparatus. When a specimen is irradiated with the focused ion beam in order to be etched, the desired etching depth of the specimen is preset as a function of a location. The ion dose of the focused ion beam, the acceleration voltage, or the etching time may be varied in accordance with the preset data.

REFERENCES:
patent: 3563809 (1971-02-01), Wilson

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