Processing method of thin-film and manufacturing method of...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S315000, C430S320000, C430S030000, C430S022000, C430S395000

Reexamination Certificate

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07569332

ABSTRACT:
A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.

REFERENCES:
patent: 4379833 (1983-04-01), Canavello et al.
patent: 4399205 (1983-08-01), Bergendahl
patent: 5721651 (1998-02-01), Kitahara
patent: 5837963 (1998-11-01), Kitahara
patent: 6399285 (2002-06-01), Kamijima
patent: 6721443 (2004-04-01), Nakata
patent: 2002/0037475 (2002-03-01), Taguchi et al.
patent: 10-214835 (1998-08-01), None
patent: 2001-066797 (2001-03-01), None

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