Processing method for photoresist master, production method...

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Reexamination Certificate

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C430S945000, C430S320000

Reexamination Certificate

active

10507429

ABSTRACT:
The present invention relates to a method for processing a photoresist-coated board, a method for manufacturing a stamper for a recording medium and a method for manufacturing a recording medium which can form a fine raised and depressed pattern having a uniform width after development even in the case where a laser beam having a relatively long wavelength is used for forming pre-pits on a recording medium with high accuracy. A photoresist-coated board108is constituted by laminating a light absorption layer108band a photosensitive material layer108con a glass substrate108ain this order and is exposed to a laser beam102by condensing the laser beam102onto the photosensitive material layer108c, thereby forming a raised and depressed pattern corresponding to pre-pits on the the photosensitive material layer108. When the length of a pre-pit to be formed is shorter than 4 T, for example, the duty ratio of the pulse signal train input to the light modulator109is varied within a range from about 50% to 65% so that a pulse signal train having a higher duty ratio is generated as the length of a pre-pit to be formed becomes longer and the power of a laser beam is modulated by the thus generated pulse signal train. On the other hand, when the length of a pre-pit to be formed is equal to or longer than 4 T, for example, a pulse signal train having a constant duty ratio is generated independently of the length of the pre-pit to be formed and the power of a laser beam is modulated by the thus generated pulse signal train.

REFERENCES:
patent: 4259433 (1981-03-01), Mizobuchi et al.
patent: 4447519 (1984-05-01), Pritikin
patent: 4615969 (1986-10-01), Strand
patent: 4737447 (1988-04-01), Suzuki et al.
patent: 4861699 (1989-08-01), Wijdenes et al.
patent: 4964958 (1990-10-01), Legierse et al.
patent: 5230772 (1993-07-01), Kadomura
patent: 5360873 (1994-11-01), Ohkawa et al.
patent: 5490126 (1996-02-01), Furumiya et al.
patent: 5501926 (1996-03-01), Cheng et al.
patent: 5635267 (1997-06-01), Yamada et al.
patent: 5674115 (1997-10-01), Yamashita et al.
patent: 5939510 (1999-08-01), Sato et al.
patent: 5948592 (1999-09-01), Umehara et al.
patent: 6127100 (2000-10-01), Shimizu
patent: 6238846 (2001-05-01), Tacken
patent: 6477136 (2002-11-01), Sakurai et al.
patent: 6562550 (2003-05-01), Takahata et al.
patent: 6699643 (2004-03-01), Asukata
patent: 6874262 (2005-04-01), Nishiyama et al.
patent: 6927016 (2005-08-01), Sano
patent: 2002/0160312 (2002-10-01), Oyake et al.
patent: 2003/0063553 (2003-04-01), Oyake et al.
patent: 2003/0170564 (2003-09-01), Kido et al.
patent: 2004/0259039 (2004-12-01), Oyake et al.
patent: 2005/0006336 (2005-01-01), Takahata et al.
patent: 2005/0039621 (2005-02-01), Oyake et al.
patent: 2005/0042427 (2005-02-01), Oyake et al.
patent: 2005/0065345 (2005-03-01), Tsuchida et al.
patent: 2005/0066825 (2005-03-01), Oyake et al.
patent: 2005/0074701 (2005-04-01), Tsukuda et al.
patent: 2005/0118534 (2005-06-01), Oyake et al.
patent: 2005/0232130 (2005-10-01), Oyake et al.
patent: 52-154403 (1977-12-01), None
patent: 53-123095 (1978-10-01), None
patent: 57-172736 (1982-10-01), None
patent: 59-093448 (1984-05-01), None
patent: 01-286144 (1989-11-01), None
patent: 2-198835 (1990-08-01), None
patent: 3-180476 (1991-08-01), None
patent: 4-263140 (1992-09-01), None
patent: 04-263140 (1992-09-01), None
patent: 4-263141 (1992-09-01), None
patent: 5-214547 (1993-08-01), None
patent: 05-290412 (1993-11-01), None
patent: 6-060436 (1994-03-01), None
patent: 6-150392 (1994-05-01), None
patent: 6-182346 (1994-07-01), None
patent: 6-215422 (1994-08-01), None
patent: 7-147026 (1995-06-01), None
patent: 8-062835 (1996-03-01), None
patent: 8-185643 (1996-07-01), None
patent: 8-273219 (1996-10-01), None
patent: 8-283950 (1996-10-01), None
patent: 8-315425 (1996-11-01), None
patent: 9-109276 (1997-04-01), None
patent: 9-171952 (1997-06-01), None
patent: 09-231569 (1997-09-01), None
patent: 09237420 (1997-09-01), None
patent: 9-292715 (1997-11-01), None
patent: 9-306893 (1997-11-01), None
patent: 10-134425 (1998-05-01), None
patent: 10-188285 (1998-07-01), None
patent: 10-204328 (1998-08-01), None
patent: 10-241213 (1998-09-01), None
patent: 10-334468 (1998-12-01), None
patent: 11-084673 (1999-03-01), None
patent: 2000-021033 (2000-01-01), None
patent: 2000-040267 (2000-02-01), None
patent: 2000-113520 (2000-04-01), None
patent: 2000-113526 (2000-04-01), None
patent: 2000-137324 (2000-05-01), None
patent: 2000-280255 (2000-10-01), None
patent: 2000276780 (2000-10-01), None
patent: 2000276782 (2000-10-01), None
patent: 2001-126309 (2001-05-01), None
patent: 2001-148122 (2001-05-01), None
patent: 2001-184734 (2001-07-01), None
patent: 2001-202661 (2001-07-01), None
patent: 2001-232943 (2001-08-01), None
patent: 2001-344831 (2001-12-01), None
patent: 2001-357571 (2001-12-01), None
patent: 2002-050043 (2002-02-01), None
patent: 2002-050087 (2002-02-01), None
patent: 2002-056539 (2002-02-01), None
patent: 2002-072489 (2002-03-01), None
patent: 2002-117578 (2002-04-01), None
patent: 2002-117579 (2002-04-01), None
patent: 2002-117588 (2002-04-01), None
patent: 96/32521 (1996-10-01), None
patent: 02/069336 (2002-09-01), None
Machine translation of JP 09-237420.
Machine translation of jp-2000-276780.
Machien translation of Jp 2000-276782.

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