Coating apparatus – Gas or vapor deposition – With treating means
Patent
1985-12-21
1990-08-21
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118715, C23C 1600
Patent
active
049496719
ABSTRACT:
A processing apparatus and method wherein two separate gas feeds are provided in proximity to the face of a face down wafer. A shroud can be used to maximize mixing of the two gas feed streams without excessive residence time.
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Davis Cecil J.
Hunter James B.
Jakubik Dwain R.
Luttmer Joseph D.
Matthews Robert T.
Barndt B. Peter
Bueker Richard
Comfort James T.
Sharp Melvin
Texas Instruments Incorporated
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