Processing apparatus and method

Coating apparatus – Gas or vapor deposition – With treating means

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118715, C23C 1600

Patent

active

049496719

ABSTRACT:
A processing apparatus and method wherein two separate gas feeds are provided in proximity to the face of a face down wafer. A shroud can be used to maximize mixing of the two gas feed streams without excessive residence time.

REFERENCES:
patent: 3297501 (1967-01-01), Reisman
patent: 4223048 (1980-09-01), Engle
patent: 4282267 (1981-08-01), Kuyel
patent: 4401054 (1983-08-01), Matsuo
patent: 4461783 (1984-07-01), Yamazaki
patent: 4512283 (1985-04-01), Bonifield
patent: 4539068 (1985-09-01), Takagi
patent: 4572842 (1986-02-01), Dietrich
patent: 4668365 (1987-05-01), Foster
patent: 4716852 (1988-01-01), Tsujii

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Processing apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Processing apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Processing apparatus and method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1669773

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.