Processing apparatus

Details Processing apparatus Processing apparatus

2005-03-28

2010-10-19

Gupta, Yogendra N (Department: 1791)

Plastic article or earthenware shaping or treating: apparatus

Means applying electrical or wave energy directly to work

Radiated energy

C264S001360, C264S494000, C355S071000

Reexamination Certificate

active

07815425

ABSTRACT:
A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, includes a supplier for supplying the resist between the substrate and the mold, and an illumination optical system for illuminating ultraviolet light onto the resist via the mold so as to cure the resist.

REFERENCES:
patent: 5354414 (1994-10-01), Feygin
patent: 5597590 (1997-01-01), Tanimoto et al.
patent: 5772905 (1998-06-01), Chou
patent: 5928593 (1999-07-01), Harrison
patent: 5985202 (1999-11-01), Ozaki et al.
patent: 6334960 (2002-01-01), Willson et al.
patent: 6387787 (2002-05-01), Mancini et al.
patent: 6482742 (2002-11-01), Chou
patent: 6517977 (2003-02-01), Resnick et al.
patent: 6653030 (2003-11-01), Mei et al.
patent: 6696220 (2004-02-01), Bailey et al.
patent: 6719915 (2004-04-01), Willson et al.
patent: 6762823 (2004-07-01), Suzuki
patent: 6805054 (2004-10-01), Meissl et al.
patent: 6932934 (2005-08-01), Choi et al.
patent: 7064805 (2006-06-01), Nemoto
patent: 7084952 (2006-08-01), Jeunink et al.
patent: 2002/0018197 (2002-02-01), Suzuki
patent: 2002/0031732 (2002-03-01), Shoji
patent: 2002/0098426 (2002-07-01), Sreenivasan et al.
patent: 2002/0150398 (2002-10-01), Choi et al.
patent: 2003/0047691 (2003-03-01), Musil et al.
patent: 2004/0048169 (2004-03-01), Miyasaka
patent: 2004/0197433 (2004-10-01), Terada et al.
patent: 2005/0270312 (2005-12-01), Lad et al.
patent: 2008/0084550 (2008-04-01), Liu
patent: 2008/0111979 (2008-05-01), Emoto
patent: 2008/0143987 (2008-06-01), Uemura
patent: 10-106921 (1998-04-01), None
patent: 2000-269122 (2000-09-01), None
patent: 2002-086463 (2002-03-01), None
patent: 2003-158067 (2003-05-01), None
patent: 2003-218007 (2003-07-01), None
patent: 02/06902 (2002-01-01), None
patent: 2004/016406 (2004-02-01), None
European Search Report issued in corresponding European Patent Application No. 05006759.4 dated Aug. 21, 2009.
Colburn, M et al. “Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning” Proceedings of the SPIE-The International Society for Optical Engineering, vol. 3676, Mar. 15, 1999, pp. 379-389. Cited in Search Report issued in corres. EP 05006759.4 dated Aug. 21, 2009; see NPL Cite No. 1.

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