Processes for their manufacture of monolithically integrated pla

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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437 90, 437129, 437133, 437970, C30B 2504

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active

048880850

ABSTRACT:
Lasers differing in emission wavelengths are disclosed monolithically integrated in a common substrate providing positive index guiding of adjacent lasers. The lasers and the substrate together present a planar semiconductive surface.
The monolithically integrated laser structure is formed by providing laterally offset channels in a planar substrate surface and selectively depositing cladding and active layers in the channels, with the composition of at least one of the cladding and active layers in one channel differing from that in another.

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