Processes and devices using polycyclic fluoroalkanes in...

Details Processes and devices using polycyclic fluoroalkanes in... Processes and devices using polycyclic fluoroalkanes in...

2005-06-09

2008-10-14

Kelly, Cynthia H. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C355S047000

Reexamination Certificate

active

07435528

ABSTRACT:
Processes and apparatuses using polycyclic fluoroalkanes that are highly transparent to UV wavelengths ranging from about 190 nm to 260 nm are provided. The polycylic fluoroalkanes are useful in a wide variety of applications, including optical couplants, optical cements, optical elements, optical inspection media for semiconductor wafers and devices, and immersion photolithography, particularly at 193 and 248 nm exposure wavelength.

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