Process simulation apparatus and method for selecting an optimum

Details Process simulation apparatus and method for selecting an optimum Process simulation apparatus and method for selecting an optimum

1995-09-19

1998-07-28

Teska, Kevin J.

Boots, shoes, and leggings

364578, 36446809, G06F 1130

Patent

active

057872694

ABSTRACT:
A process simulation apparatus simulates a manufacturing process of a semiconductor device which manufacturing process comprising various processes including an ion implantation process and a diffusion process. Process sequence data which represents conditions of a two-dimensional simulation for each process is input to a memory unit. The memory unit stores the process sequence data and also stores condition information for various simulation models usable for each process. An optimum simulation model for each process is selected for performing a two-dimensional simulation for each process. The semiconductor device manufacturing process is simulated by a two-dimensional simulation method using the selected optimum simulation model.

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patent: 5495417 (1996-02-01), Fuduka et al.
patent: 5504016 (1996-04-01), Aronowitz

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