Process-parameter prognostic system for predicting shape of...

Details Process-parameter prognostic system for predicting shape of... Process-parameter prognostic system for predicting shape of...

2011-08-23

2011-08-23

Masinick, Michael D (Department: 2122)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C700S121000, C703S002000, C438S710000

Reexamination Certificate

active

08005562

ABSTRACT:
Provided are a process-parameter prognostic system for predicting the shape of a semiconductor structure, a semiconductor fabrication apparatus having the process-parameter prognostic system, and a method of using the same. The process-parameter prognostic system may have a process prediction unit and a process-change point corresponding unit. The process prediction unit and the process-change point corresponding unit may obtain predicted parameters using measured parameters of semiconductor structures and sensor parameters of plasmas corresponding to the semiconductor structures.

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