Process of using photoresist treating composition containing a m

Details Process of using photoresist treating composition containing a m Process of using photoresist treating composition containing a m

1985-10-28

1987-09-08

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Removal of imaged layers

430149, 430169, 430302, 430326, 430331, 430309, G03C 500

Patent

active

046923985

ABSTRACT:
The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.

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