Process of using N-alkynyl polyvinylpyridinium resists having el

Details Process of using N-alkynyl polyvinylpyridinium resists having el Process of using N-alkynyl polyvinylpyridinium resists having el

1986-03-18

1987-06-30

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430296, 430325, 430319, 430326, G03C 500

Patent

active

046770488

ABSTRACT:
N-alkynyl polyvinylpyridinium resists, which are sensitive to both electrons and deep U.V., are disclosed.

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King, H. N. G., "Electron Lithography", Solid State Technology, Feb. 1982, pp. 102--105.
Piwczyk, B. P., Williams, A. E., "Electron Beam Lithography for the 80s" Solid State Technology, Jun. 1982, pp. 74--82.
Thompson, L. F., "Design of Polymer Resists for Electron Lithography" Solid State Technology, Jul. 1974, pp. 27--28.
Thompson, L. F. and Kerwin, R. E., "Polymer Resist Systems for Photo- and Electron Lithography", Polymer Resist Systems, pp. 267-281, (1976).

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