Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Simultaneous radiation imaging and etching of substrate
Patent
1989-11-29
1991-08-27
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Simultaneous radiation imaging and etching of substrate
430321, 430396, 430944, 430945, G03C 500
Patent
active
050432516
ABSTRACT:
A process of three dimensional lithography in amorphous polymers to form an instantaneous, permanent image in the polymer by the steps of providing an undoped, non-crystalline layer or film of a polymer having a stable amorphous state under human operating conditions. The film is preferably poly(ethyleneterphthalate) (PET), poly(aryl-ether-ether-ketone) (PEEK), poly(chloro-trifluoroethylene) (Kel-F.RTM.), poly(carbonate) (ie LEXAN 9032.RTM.), poly(sulfone), poly(methylmethacrylate(PMMA, or LUCITE.RTM.), a poly(cyanurate) such as bisphenol A dicyanate, or an epoxy (eg. Epon 820.RTM.). The film can be either self supporting or mounted on a substrate. The film is then covered (and optionally contacted) with a mask which serves to block the radiation from impinging on where no marking is desired. If the mask is in actual contact with the film, it is capable of also acting as a heat sink. Next, the film is exposed through the mask to radiation of sufficient intensity to cause ablation of the exposed areas imparting a distinct, three-dimensional impression in the film. The film may then, for example, be processed by metalization and coating with a protective layer to form a finished product of an optical data storage disk.
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Andrew et al. "Direct Etching of Polymeric Materials Using a XeCl Laser", Appl. Phys. Lett. 43(8), Oct. 15, 1983, pp. 717-719.
Srinivasan et al., "Ablative Photodecomposition of Polymer Films by the Pulsed Far-Ultraviolet (193 nm) Laser Radiation Dependence of Etch Depth on Experimental Conditions" Journal of Polymer Science: Polymer Chemistry Edition, 22, pp. 2601-2609, (1984).
Pearson, "Polymeric Optical Disk Recording Media", CRC Critical Reviews in Solid State and Materials Sciences, 13(1), pp. 1-26, (1986).
Fang et al. "Laser Annealing of Polyetheretherketone (PEEK)", Polymer Engineering & Sciences, vol. 29, No. 18, pp. 1241-1245, Sep. 1989.
Roland Charles M.
Sonnenschein Mark F.
Baxter Janet C.
Bowers Jr. Charles L.
Edelberg Barry A.
McDonnell Thomas E.
The United States of America as represented by the Secretary of
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