Semiconductor device manufacturing: process – Chemical etching
Reexamination Certificate
2005-05-10
2005-05-10
Zaradian, Amir (Department: 2822)
Semiconductor device manufacturing: process
Chemical etching
C438S712000, C438S745000
Reexamination Certificate
active
06890855
ABSTRACT:
A process of removing residue from an etched precision surface. In this process the etched precision surface is contacted with a composition which includes liquid or supercritical carbon dioxide and a fluoride-generating species.
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Cotte John Michael
McCullough Kenneth John
Moreau Wayne Martin
Pope Keith R.
Simons John P.
International Business Machines - Corporation
Morris, Esq. Daniel P.
Perkins Pamela E
Scully Scott Murphy & Presser
Zaradian Amir
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