Process of producing vinyl chloride polymer by using condensatio

Details Process of producing vinyl chloride polymer by using condensatio Process of producing vinyl chloride polymer by using condensatio

1998-02-06

2000-09-19

Henderson, Christopher

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymerizing in reactor of specified material, or in reactor...

C08F 220

Patent

active

06121390&

ABSTRACT:
There is provided a polymer scale deposition preventive agent, comprising an alkaline solution of a condensation product having a molecular weight of 500 to 1,000,000 obtained by condensing a dimer compound of 2,3-dihydroxynaphthalene with formaldehyde. By polymerizing vinyl chloride or a monomer mixture containing vinyl chloride in a polymerization vessel wherein a coating film made of said polymer scale deposition preventive agent has been formed on the inner wall surface and the like, polymer scale is effectively prevented from depositing not only on an agitation apparatus but also on areas near the interface between a gas phase and a liquid phase, which prevention of the polymer scale deposition is conventionally difficult. Thus, a vinyl chloride polymer can be obtained which contains colored foreign matters, fish eyes, etc. in small amounts and is small in initial discoloration and is good in quality.

REFERENCES:
patent: 4431783 (1984-02-01), Walker et al.
patent: 5508361 (1996-04-01), Shimizu et al.
patent: 5576370 (1996-11-01), Shimizu et al.
patent: 5616660 (1997-04-01), Shimizu et al.

Affiliated with

Also associated with

Rating

Process of producing vinyl chloride polymer by using condensatio does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process of producing vinyl chloride polymer by using condensatio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process of producing vinyl chloride polymer by using condensatio will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1074179