Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1984-09-13
1985-06-18
Ozaki, George T.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
29572, 148 15, 148172, 148187, 148188, 148189, 264177F, 264212, 427 85, 427 86, 428620, 428939, H01L 21208
Patent
active
045239665
ABSTRACT:
The disclosed process produces a silicon ribbon wafer with a p-n junction, by melting a raw silicon material, ejecting the molten silicon material onto a rotary cooling member so as to produce a silicon ribbon wafer through super-rapid cooling, and applying an impurity element whose polarity is opposite to that of the raw silicon material onto the thus formed silicon ribbon wafer at a temperature of not lower than 600.degree. C. and cooled from said temperature, whereby a p-n junction is formed in the silicon ribbon wafer simultaneously with the production of the fully solidified silicon ribbon wafer.
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CRC Handbook of Chemistry and Physics, 60th edn., 1979-1980, CRC Press, Inc., Boca Raton, FL, p. B-21.
Carlson, D. E., "Amorphous Silicon Solar Cells", IEEE Trans. on Electron Devices, vol. ED-24, No. 4, Apr. 1977.
Arai Ken-ichi
Takeuchi Toshio
Tsuya Noboru
Ozaki George T.
Tohoku University
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